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United States of America: DOE awards Nanograf USD 60 million to support the company’s silicon anode manufacturing facility project

Description

On 20 September 2024, the US Department of Energy announced that it would award Nanograf USD 60 million in funding to build an advanced manufacturing facility in Flint, Michigan, to produce 2'500 tonn...

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Intervention Details

Intervention Type

Financial grant

MAST Chapter

L: Subsidies (excl. export subsidies)

Implementation date

20 Sep 2024

Revocation date

No revocation date

Implementation level

National

Affected flow

Inward

Announced as temporary

No

Eligible firms

firm-specific

Affected Trading Partners

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Affected Sectors

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Affected Products

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